Book

In the sophisticated world of microelectronics manufacturing, lithography is the key to miniaturization and high-performance integrated circuits. With the continuous progress of technology, the requirements of lithography resolution and production efficiency are increasing day by day, and the traditional lithography technology is facing unprecedented challenges. Digital Micromirror device (DMD) lithography technology, with its high contrast and fast refresh rate, has become an important tool in the field of micro and nano manufacturing. However, how to improve the lithographic accuracy and pattern quality while maintaining high efficiency is still an urgent problem to be solved in the industry. This book, "Optimization of DMD Digital Lithography" by Dr. Shengzhou Huang and his team, brings together their latest research results in the field of DMD lithography optimization. (1) A simulated annealing enhanced genetic algorithm (SA-GA) is proposed to optimize mask design and significantly improve the accuracy of lithography simulation. (2) How to optimize DMD lithography process by hybrid genetic algorithm and improved exposure model is further discussed. The book details how to enhance the diversity of the algorithm by introducing Gaussian noise, and achieve precise adjustment of the parameters of the exposure model through genetic operations such as two-point crossing and bit flip variation. (3) Aiming at the problem of edge jagging caused by non-integer pixel errors in DMD lithography, an optimization method of pixel overlap is proposed. This book not only introduces the theoretical basis and implementation methods of these optimization techniques in detail, but also demonstrates the remarkable effect of these techniques in improving the accuracy and efficiency of lithography through a large number of simulation experiments and practical cases.